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Item Statistics
Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivity
Repository | University of Queensland [UQ eSpace] |
URL | https://espace.library.uq.edu.au/view/UQ:202986 |
Author(s) | Blakey, Idriss; Chen, Lan; Goh, Yong Keng; Lawrie, Kirsten Jean; Chuang, Ya-mi; Piscani, Emil; Zimmerman, Paul A.; Whittaker, Andrew K. |
Item type | Conference Papers/Posters |
Journal | Optical Engineering, Print_ISSN:0091-3286, Online_ISSN:1560-2303 |
DOI | https://doi.org/10.1117/12.814076 |