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Item Statistics

Non-CA resists for 193nm immersions lithography: Effects of chemical structure on sensitivity

RepositoryUniversity of Queensland [UQ eSpace]
URLhttps://espace.library.uq.edu.au/view/UQ:202986
Author(s)Blakey, Idriss; Chen, Lan; Goh, Yong Keng; Lawrie, Kirsten Jean; Chuang, Ya-mi; Piscani, Emil; Zimmerman, Paul A.; Whittaker, Andrew K.
Item typeConference Papers/Posters
JournalOptical Engineering, Print_ISSN:0091-3286, Online_ISSN:1560-2303
DOIhttps://doi.org/10.1117/12.814076

Usage Date Range

Note: Daily statistics are only available for the last six weeks.

     

Country Reporting Period Total 2021-12-11 2021-12-12 2021-12-13 2021-12-14 2021-12-15 2021-12-16 2021-12-17 2021-12-18 2021-12-19 2021-12-20 2021-12-21 2021-12-22 2021-12-23 2021-12-24
Overall totals 2 1 0 0 0 0 0 0 0 0 0 0 0 0 1
United States 1 1 0 0 0 0 0 0 0 0 0 0 0 0 0
Unknown 1 0 0 0 0 0 0 0 0 0 0 0 0 0 1
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